A nickel oxide (NiO) target is a crucial material used in thin film deposition processes, primarily through sputtering. Sputtering is a physical vapor deposition (PVD) technique where a target material, in this case, nickel oxide, is bombarded with ions, causing atoms or molecules to be ejected and deposited as a thin film onto a substrate. Nickel oxide targets are manufactured to hig... https://www.mahttps://www.marketresearchfuture.com/reports/nickel-oxide-target-market-39209rketresearchfuture.com/reports/nickel-oxide-target-market-39209